Control of ion flux-energy distributions by low frequency square-shaped tailored voltage waveforms in capacitively coupled plasmas. (1st May 2022)
- Record Type:
- Journal Article
- Title:
- Control of ion flux-energy distributions by low frequency square-shaped tailored voltage waveforms in capacitively coupled plasmas. (1st May 2022)
- Main Title:
- Control of ion flux-energy distributions by low frequency square-shaped tailored voltage waveforms in capacitively coupled plasmas
- Authors:
- Hartmann, P
Korolov, I
Escandón-López, J
van Gennip, W
Buskes, K
Schulze, J - Abstract:
- Abstract: Capacitively coupled plasmas are routinely used in an increasing number of technological applications, where a precise control of the quantity and the shape of the energy distribution of ion fluxes impacting boundary surfaces is required. Oftentimes, narrow peaks at controllable energies are required, e.g. to improve selectivity in plasma etching, which cannot be realized in classical discharges. We combine experimental ion flux-energy distribution measurements and PIC/MCC simulations to provide insights into the operation and ion acceleration mechanisms for discharges driven by square-shaped tailored voltage waveforms composed of low-frequency (100 kHz) pulsed and high-frequency (27.12 MHz) signals. The formation of ion flux-energy distributions with a narrow high energy peak and strongly reduced ion fluxes at intermediate energies is observed. The position of the high energy peak on the energy axis can be controlled by adjusting the low-frequency voltage pulse magnitude and duty cycle. The effects of tailoring the driving voltage waveform by adjusting these control parameters as well as its repetition rate on the plasma operation and the ion flux-energy distribution are analysed in depth. We find, e.g. that the duty cycle regime ( < 40 % or > 60 %) determines if the high energy ions form at the grounded or the powered electrode and that the duration of the pulse must exceed the ion energy relaxation time, on the order of 0.5 μ s.
- Is Part Of:
- Plasma sources science & technology. Volume 31:Number 5(2022)
- Journal:
- Plasma sources science & technology
- Issue:
- Volume 31:Number 5(2022)
- Issue Display:
- Volume 31, Issue 5 (2022)
- Year:
- 2022
- Volume:
- 31
- Issue:
- 5
- Issue Sort Value:
- 2022-0031-0005-0000
- Page Start:
- Page End:
- Publication Date:
- 2022-05-01
- Subjects:
- capacitively coupled plasmas -- low frequency and high voltage discharges -- plasma–surface interactions -- tailored voltage waveforms -- plasma etching
Plasma (Ionized gases) -- Periodicals
530.44 - Journal URLs:
- http://ioppublishing.org/ ↗
http://iopscience.iop.org/1009-0630 ↗ - DOI:
- 10.1088/1361-6595/ac6e05 ↗
- Languages:
- English
- ISSNs:
- 0963-0252
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 21946.xml