Cite
HARVARD Citation
Hu, X. et al. (2022). Improvement on the uniformity of deep reactive ion etch for electrically isolated silicon-based substrates. Journal of micromechanics and microengineering. p. . [Online].
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Hu, X. et al. (2022). Improvement on the uniformity of deep reactive ion etch for electrically isolated silicon-based substrates. Journal of micromechanics and microengineering. p. . [Online].