Cite
HARVARD Citation
Tu, R. et al. (2022). High-throughput growth of HfO2 films using temperature-gradient laser chemical vapor deposition. RSC advances. 12 (24), pp. 15555-15563. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Tu, R. et al. (2022). High-throughput growth of HfO2 films using temperature-gradient laser chemical vapor deposition. RSC advances. 12 (24), pp. 15555-15563. [Online].