Wafer-sized WS2 monolayer deposition by sputtering. Issue 17 (17th March 2022)
- Record Type:
- Journal Article
- Title:
- Wafer-sized WS2 monolayer deposition by sputtering. Issue 17 (17th March 2022)
- Main Title:
- Wafer-sized WS2 monolayer deposition by sputtering
- Authors:
- Villamayor, Michelle Marie S.
Husain, Sajid
Oropesa-Nuñez, Reinier
Johansson, Fredrik O. L.
Lindblad, Rebecka
Lourenço, Pedro
Bernard, Romain
Witkowski, Nadine
Prévot, Geoffroy
Sorgenfrei, Nomi L. A. N.
Giangrisostomi, Erika
Föhlisch, Alexander
Svedlindh, Peter
Lindblad, Andreas
Nyberg, Tomas - Abstract:
- Abstract : Radio frequency sputtering by argon ions on a target consisting of tungsten disulphide can create a single layer of the compound on a 4′′ Si-wafer with one W atom per two S atoms when including hydrogen sulphide in the sputtering atmosphere. Abstract : We demonstrate that tungsten disulphide (WS2 ) with thicknesses ranging from monolayer (ML) to several monolayers can be grown on SiO2 /Si, Si, and Al2 O3 by pulsed direct current-sputtering. The presence of high quality monolayer and multilayered WS2 on the substrates is confirmed by Raman spectroscopy since the peak separations between the A1g -E2g and A1g -2LA vibration modes exhibit a gradual increase depending on the number of layers. X-ray diffraction confirms a textured (001) growth of WS2 films. The surface roughness measured with atomic force microscopy is between 1.5 and 3 Å for the ML films. The chemical composition WS x ( x = 2.03 ± 0.05) was determined from X-ray Photoelectron Spectroscopy. Transmission electron microscopy was performed on a multilayer film to show the 2D layered structure. A unique method for growing 2D layers directly by sputtering opens up the way for designing 2D materials and batch production of high-uniformity and high-quality (stochiometric, large grain sizes, flatness) WS2 films, which will advance their practical applications in various fields.
- Is Part Of:
- Nanoscale. Volume 14:Issue 17(2022)
- Journal:
- Nanoscale
- Issue:
- Volume 14:Issue 17(2022)
- Issue Display:
- Volume 14, Issue 17 (2022)
- Year:
- 2022
- Volume:
- 14
- Issue:
- 17
- Issue Sort Value:
- 2022-0014-0017-0000
- Page Start:
- 6331
- Page End:
- 6338
- Publication Date:
- 2022-03-17
- Subjects:
- Nanoscience -- Periodicals
Nanotechnology -- Periodicals
620.505 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/NR/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d1nr08375a ↗
- Languages:
- English
- ISSNs:
- 2040-3364
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9830.266000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 21590.xml