Epitaxial Dirac Semimetal Vertical Heterostructures for Advanced Device Architectures. (12th February 2022)
- Record Type:
- Journal Article
- Title:
- Epitaxial Dirac Semimetal Vertical Heterostructures for Advanced Device Architectures. (12th February 2022)
- Main Title:
- Epitaxial Dirac Semimetal Vertical Heterostructures for Advanced Device Architectures
- Authors:
- Rice, Anthony D.
Lee, Choong Hee
Fluegel, Brian
Norman, Andrew G.
Nelson, Jocienne N.
Jiang, Chun Sheng
Steger, Mark
McGott, Deborah L.
Walker, Patrick
Alberi, Kirstin - Abstract:
- Abstract: Exploiting the extraordinary transport and optical properties of 3D topological semimetals for device applications requires epitaxial integration with semiconductors to carefully control carrier transport, yet no studies have established heteroepitaxy on top of any topological semimetals to date. Here, a novel approach toward fabricating heterostructures is demonstrated by epitaxially incorporating the Dirac semimetal Cd3 As2 between Znx Cd1‐x Te and CdTe layers via molecular beam epitaxy on GaAs (001) substrates. The approach utilizes the higher energy (001) surface of Cd3 As2 to stabilize 2D epitaxy of zinc blende semiconductors. To demonstrate the impact heterostructure formation offers to device performance, an all‐epitaxial, barrier‐type vertical photodetector is fabricated that accesses a different carrier separation mechanism than previously reported non‐epitaxial junctions and consequently exhibits significantly reduced dark currents. The results highlight the important role that epitaxial integration can play in accessing advanced architectures for topological semimetal‐based devices. Abstract : Heteroepitaxy of semiconductors is demonstrated on top of the topological Dirac semimetal Cd3 As2 . The ability to incorporate topological semimetals within complex semiconductor device structures offers new pathways for advanced architectures with superior control of majority and minority carrier transport, as demonstrated for a barrier‐type photodetector.
- Is Part Of:
- Advanced functional materials. Volume 32:Number 21(2022)
- Journal:
- Advanced functional materials
- Issue:
- Volume 32:Number 21(2022)
- Issue Display:
- Volume 32, Issue 21 (2022)
- Year:
- 2022
- Volume:
- 32
- Issue:
- 21
- Issue Sort Value:
- 2022-0032-0021-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-02-12
- Subjects:
- heteroepitaxy -- photodetector -- topological semimetal
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.202111470 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 21555.xml