Analysis of Carrier Behavior for Amorphous Indium Gallium Zinc Oxide After Supercritical Carbon Dioxide Treatment. Issue 14 (25th March 2022)
- Record Type:
- Journal Article
- Title:
- Analysis of Carrier Behavior for Amorphous Indium Gallium Zinc Oxide After Supercritical Carbon Dioxide Treatment. Issue 14 (25th March 2022)
- Main Title:
- Analysis of Carrier Behavior for Amorphous Indium Gallium Zinc Oxide After Supercritical Carbon Dioxide Treatment
- Authors:
- Zhang, Jiaona
Zhang, Min
Chang, Kuan‐Chang
Rong, Zhao
Zhang, Yuqing
Zhang, Shengdong
Chan, Mansun - Abstract:
- Abstract: Amorphous indium gallium zinc oxide (a‐IGZO) thin‐film quality can be enhanced using supercritical carbon dioxide (SCCO2 ). How to verify specific and accurate mechanism for the carriers inside an a‐IGZO layer before and after the SCCO2 treatment is worth investigating. This work designs a‐IGZO thin film transistors with different channel thicknesses (41, 28, and 19 nm), treats them using SCCO2, and analyzes the change in carrier behavior. The effect of the SCCO2 on both carrier density and carrier transport is investigated using energy band information, Technology Computer Aided Design (TCAD) simulations on density of states and resistance analyses. After the treatment, the thinner channel thickness exhibits better drivability enhancement. That is because of the fewer traps and smoother carrier transportation path resulted from better M−O−M frameworks, and decreased M−OH bonds as well as interface charges. Besides the traditional analysis methods and TCAD simulations, layer‐by‐layer X‐ray photoelectron spectroscopy and sheet resistance measurement are also applied to verify the detailed carrier mechanism behind different phenomena. Abstract : This work demonstrates that the increased oxygen vacancies inside amorphous indium gallium zinc oxide (a‐IGZO) after supercritical carbon dioxide treatment are mainly carriers, and the vacancy‐related traps are decreased. Carriers in thicker a‐IGZO film are more difficult to transport after the treatment than those inAbstract: Amorphous indium gallium zinc oxide (a‐IGZO) thin‐film quality can be enhanced using supercritical carbon dioxide (SCCO2 ). How to verify specific and accurate mechanism for the carriers inside an a‐IGZO layer before and after the SCCO2 treatment is worth investigating. This work designs a‐IGZO thin film transistors with different channel thicknesses (41, 28, and 19 nm), treats them using SCCO2, and analyzes the change in carrier behavior. The effect of the SCCO2 on both carrier density and carrier transport is investigated using energy band information, Technology Computer Aided Design (TCAD) simulations on density of states and resistance analyses. After the treatment, the thinner channel thickness exhibits better drivability enhancement. That is because of the fewer traps and smoother carrier transportation path resulted from better M−O−M frameworks, and decreased M−OH bonds as well as interface charges. Besides the traditional analysis methods and TCAD simulations, layer‐by‐layer X‐ray photoelectron spectroscopy and sheet resistance measurement are also applied to verify the detailed carrier mechanism behind different phenomena. Abstract : This work demonstrates that the increased oxygen vacancies inside amorphous indium gallium zinc oxide (a‐IGZO) after supercritical carbon dioxide treatment are mainly carriers, and the vacancy‐related traps are decreased. Carriers in thicker a‐IGZO film are more difficult to transport after the treatment than those in original film as more scattering occurs. … (more)
- Is Part Of:
- Advanced materials interfaces. Volume 9:Issue 14(2022)
- Journal:
- Advanced materials interfaces
- Issue:
- Volume 9:Issue 14(2022)
- Issue Display:
- Volume 9, Issue 14 (2022)
- Year:
- 2022
- Volume:
- 9
- Issue:
- 14
- Issue Sort Value:
- 2022-0009-0014-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-03-25
- Subjects:
- amorphous indium gallium zinc oxide -- carrier behavior -- oxygen vacancy -- supercritical carbon dioxide treatment -- transistor characteristics
Materials science -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2196-7350 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/admi.202102349 ↗
- Languages:
- English
- ISSNs:
- 2196-7350
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.898450
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 21473.xml