Cite
HARVARD Citation
Ali, T. et al. (2022). Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films. Advanced Electronic Materials. p. n/a. [Online].
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Ali, T. et al. (2022). Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films. Advanced Electronic Materials. p. n/a. [Online].