Cite
HARVARD Citation
Liu, Z. et al. (2022). Effect of nitrogen partial pressure on the TCR of magnetron sputtered indium tin oxide thin films at high temperatures. Ceramics international. 48 (9), pp. 12924-12931. [Online].
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Liu, Z. et al. (2022). Effect of nitrogen partial pressure on the TCR of magnetron sputtered indium tin oxide thin films at high temperatures. Ceramics international. 48 (9), pp. 12924-12931. [Online].