Cite
HARVARD Citation
Sakata, T. et al. (2022). Effects of post‐deposition annealing on chemical composition of SiNx film in SiO2/SiNx/SiO2/Si stacked structure. Surface and interface analysis. pp. 661-666. [Online].
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Sakata, T. et al. (2022). Effects of post‐deposition annealing on chemical composition of SiNx film in SiO2/SiNx/SiO2/Si stacked structure. Surface and interface analysis. pp. 661-666. [Online].