Cite
HARVARD Citation
Pattyn, C. et al. (2022). Controlled deposition of plasma‐polyaniline thin film by PECVD: Understanding the influence of aniline to argon ratio. Plasma processes and polymers. 19 (5), p. n/a. [Online].
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Pattyn, C. et al. (2022). Controlled deposition of plasma‐polyaniline thin film by PECVD: Understanding the influence of aniline to argon ratio. Plasma processes and polymers. 19 (5), p. n/a. [Online].