Cite
HARVARD Citation
Li, H. et al. (2022). Reducing Contact Resistance and Boosting Device Performance of Monolayer MoS2 by In Situ Fe Doping. Advanced materials. 34 (18), p. n/a. [Online].
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Li, H. et al. (2022). Reducing Contact Resistance and Boosting Device Performance of Monolayer MoS2 by In Situ Fe Doping. Advanced materials. 34 (18), p. n/a. [Online].