Cite
HARVARD Citation
Ko, B. et al. (2021). Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O3 reactants. Dalton transactions. 50 (48), pp. 17935-17944. [Online].
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Ko, B. et al. (2021). Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O3 reactants. Dalton transactions. 50 (48), pp. 17935-17944. [Online].