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HARVARD Citation
Wilson, R. et al. (2021). Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate). RSC advances. 11 (36), pp. 22199-22205. [Online].