Large-scale evaluation of 2, 4-D choline off-target movement and injury in 2, 4-D-susceptible soybean. (26th February 2022)
- Record Type:
- Journal Article
- Title:
- Large-scale evaluation of 2, 4-D choline off-target movement and injury in 2, 4-D-susceptible soybean. (26th February 2022)
- Main Title:
- Large-scale evaluation of 2, 4-D choline off-target movement and injury in 2, 4-D-susceptible soybean
- Authors:
- Werle, Rodrigo
Mobli, Ahmadreza
Striegel, Sarah
Arneson, Nicholas
DeWerff, Ryan
Brown, Ashli
Oliveira, Maxwel - Abstract:
- Abstract: Enlist E3 TM soybean cultivars permit over-the-top application of labeled glyphosate, glufosinate, and 2, 4-D choline products. Increased Enlist E3 TM trait adoption and use of 2, 4-D choline postemergence across U.S. soybean production systems raise concerns regarding potential for 2, 4-D off-target movement (OTM). A large-scale drift experiment was established near Sun Prairie, WI, and Arlington, WI, in 2019 and 2020, respectively. A 2, 4-D-resistant soybean cultivar was planted in the center of the field (∼3 ha), while the surrounding area was planted with a 2, 4-D-susceptible cultivar. An application of 785 ae ha −1 2, 4-D choline plus 834 g ae ha −1 glyphosate was completed within the center block at R2 and V6 growth stages on August 1, 2019, and July 3, 2020, respectively. Filter papers were placed in-swath and outside of the treated area in one upwind transect and three downwind transects to estimate particle deposition. Low-volume air samplers ran for the 0.5-h to 48-h period following application to estimate 2, 4-D air concentration. Injury to 2, 4-D-susceptible soybean was assessed 21 d after treatment (0% to 100% injury). The 2, 4-D deposition in-swath was 9, 966 and 5, 727 ng cm −2 in 2019 and 2020, respectively. Three-parameter log-logistic models estimated the distance to 90% reduction in 2, 4-D deposition (D90 ) to be 0.63 m and 0.90 m in 2019 and 2020, respectively. In 2020, the 2, 4-D air concentration detected was lower for the upwind (0.395 ng mAbstract: Enlist E3 TM soybean cultivars permit over-the-top application of labeled glyphosate, glufosinate, and 2, 4-D choline products. Increased Enlist E3 TM trait adoption and use of 2, 4-D choline postemergence across U.S. soybean production systems raise concerns regarding potential for 2, 4-D off-target movement (OTM). A large-scale drift experiment was established near Sun Prairie, WI, and Arlington, WI, in 2019 and 2020, respectively. A 2, 4-D-resistant soybean cultivar was planted in the center of the field (∼3 ha), while the surrounding area was planted with a 2, 4-D-susceptible cultivar. An application of 785 ae ha −1 2, 4-D choline plus 834 g ae ha −1 glyphosate was completed within the center block at R2 and V6 growth stages on August 1, 2019, and July 3, 2020, respectively. Filter papers were placed in-swath and outside of the treated area in one upwind transect and three downwind transects to estimate particle deposition. Low-volume air samplers ran for the 0.5-h to 48-h period following application to estimate 2, 4-D air concentration. Injury to 2, 4-D-susceptible soybean was assessed 21 d after treatment (0% to 100% injury). The 2, 4-D deposition in-swath was 9, 966 and 5, 727 ng cm −2 in 2019 and 2020, respectively. Three-parameter log-logistic models estimated the distance to 90% reduction in 2, 4-D deposition (D90 ) to be 0.63 m and 0.90 m in 2019 and 2020, respectively. In 2020, the 2, 4-D air concentration detected was lower for the upwind (0.395 ng m −3 ) than the downwind direction (1.34 ng m −3 ), although both were lower than the amount detected in-swath (4.01 ng m −3 ). No soybean injury was observed in the downwind or upwind directions. Our results suggest that 2, 4-D choline applications following label recommendations pose little risk to 2, 4-D-susceptible soybean cultivars; however, further work is needed to understand 2, 4-D choline OTM under different environmental conditions and the presence of other susceptible crops. … (more)
- Is Part Of:
- Weed technology. Volume 36:Number 1(2022)
- Journal:
- Weed technology
- Issue:
- Volume 36:Number 1(2022)
- Issue Display:
- Volume 36, Issue 1 (2022)
- Year:
- 2022
- Volume:
- 36
- Issue:
- 1
- Issue Sort Value:
- 2022-0036-0001-0000
- Page Start:
- 8
- Page End:
- 14
- Publication Date:
- 2022-02-26
- Subjects:
- 2, 4-D -- 2 -- 4-Dicholorophenoxyacetic-acid -- soybean -- Glycine max (L.) Merr
2, 4-D choline compatible crop -- 2, 4-D drift -- 2, 4-D-resistant soybean -- crop injury
Weeds -- Periodicals
Weeds -- Control -- Periodicals
632.5 - Journal URLs:
- https://www.cambridge.org/core/journals/weed-technology ↗
- DOI:
- 10.1017/wet.2021.62 ↗
- Languages:
- English
- ISSNs:
- 0890-037X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library STI - ELD Digital store
- Ingest File:
- 21324.xml