Improvement of Thermal and Environmental Stabilities of Short Channel Coplanar Amorphous InGaZnO Thin‐Film Transistors by Introducing Amorphous ZrAlOx Interlayer. Issue 4 (29th October 2021)
- Record Type:
- Journal Article
- Title:
- Improvement of Thermal and Environmental Stabilities of Short Channel Coplanar Amorphous InGaZnO Thin‐Film Transistors by Introducing Amorphous ZrAlOx Interlayer. Issue 4 (29th October 2021)
- Main Title:
- Improvement of Thermal and Environmental Stabilities of Short Channel Coplanar Amorphous InGaZnO Thin‐Film Transistors by Introducing Amorphous ZrAlOx Interlayer
- Authors:
- Lee, Jiseob
Lee, Suhui
Islam, Md Mobaidul
Jang, Jin - Abstract:
- Abstract : The short channel coplanar amorphous indium gallium zinc oxide (a‐IGZO) thin‐film transistor (TFT) is reported by introducing a ZrAlO x (ZAO) interlayer deposited by spray pyrolysis at the substrate temperature of 350 °C. The atomic ratio (at. %) of In:Ga:Zn:O is 1:2.5:1.2:5.2 in the a‐IGZO film deposited by sputtering. The a‐IGZO TFT with ZAO layer with 0.87 μm channel length exhibits the field‐effect mobility of 6.44 cm 2 V −1 s −1, the threshold voltage of −2.16 V, and on/off current ratio of 7.6 × 10 7 . It is found from the X‐ray photoelectron spectroscopy depth profile and high‐resolution transmission electron microscope analysis that some Zr atoms diffuse into the a‐IGZO underlayer. The formation of ZrO bonds on a‐IGZO surface region reduces the carrier concentration in the a‐IGZO TFT offset region, between source/drain contact and the channel, and blocks the carrier diffusion into the channel. This reduces the field‐effect mobility of 10 μm channel length TFT from 21.86 to 14.01 cm 2 V −1 s −1, but the ZAO layer protects the a‐IGZO from the diffusion of H2 O and O2 . As a result, 0.87 μm TFT shows high on/off current ratio and stable under 85 °C and 85% relative humidity test for 2 days. Abstract : Herein, a new interlayer ZrAlO x (ZAO) by spray pyrolysis for oxide thin‐film transistors (TFTs) is introduced. The ZAO layer on amorphous indium gallium zinc oxide (a‐IGZO) can protect the diffusion of water vapor and O into the a‐IGZO. Therefore, the ZAOAbstract : The short channel coplanar amorphous indium gallium zinc oxide (a‐IGZO) thin‐film transistor (TFT) is reported by introducing a ZrAlO x (ZAO) interlayer deposited by spray pyrolysis at the substrate temperature of 350 °C. The atomic ratio (at. %) of In:Ga:Zn:O is 1:2.5:1.2:5.2 in the a‐IGZO film deposited by sputtering. The a‐IGZO TFT with ZAO layer with 0.87 μm channel length exhibits the field‐effect mobility of 6.44 cm 2 V −1 s −1, the threshold voltage of −2.16 V, and on/off current ratio of 7.6 × 10 7 . It is found from the X‐ray photoelectron spectroscopy depth profile and high‐resolution transmission electron microscope analysis that some Zr atoms diffuse into the a‐IGZO underlayer. The formation of ZrO bonds on a‐IGZO surface region reduces the carrier concentration in the a‐IGZO TFT offset region, between source/drain contact and the channel, and blocks the carrier diffusion into the channel. This reduces the field‐effect mobility of 10 μm channel length TFT from 21.86 to 14.01 cm 2 V −1 s −1, but the ZAO layer protects the a‐IGZO from the diffusion of H2 O and O2 . As a result, 0.87 μm TFT shows high on/off current ratio and stable under 85 °C and 85% relative humidity test for 2 days. Abstract : Herein, a new interlayer ZrAlO x (ZAO) by spray pyrolysis for oxide thin‐film transistors (TFTs) is introduced. The ZAO layer on amorphous indium gallium zinc oxide (a‐IGZO) can protect the diffusion of water vapor and O into the a‐IGZO. Therefore, the ZAO passivated TFT with less than 1 μm channel length is stable in humid environment. … (more)
- Is Part Of:
- Advanced engineering materials. Volume 24:Issue 4(2022)
- Journal:
- Advanced engineering materials
- Issue:
- Volume 24:Issue 4(2022)
- Issue Display:
- Volume 24, Issue 4 (2022)
- Year:
- 2022
- Volume:
- 24
- Issue:
- 4
- Issue Sort Value:
- 2022-0024-0004-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2021-10-29
- Subjects:
- indium gallium zinc oxide -- short channel thin-film transistor -- spray pyrolysis -- zirconium aluminum oxide
Materials -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/adem.202100957 ↗
- Languages:
- English
- ISSNs:
- 1438-1656
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.851200
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 21293.xml