Cite
HARVARD Citation
Cech, V. et al. (2022). Nonthermal tetravinylsilane plasma used for thin‐film deposition: Plasma chemistry controls thin‐film chemistry. Plasma processes and polymers. 19 (4), p. n/a. [Online].
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Cech, V. et al. (2022). Nonthermal tetravinylsilane plasma used for thin‐film deposition: Plasma chemistry controls thin‐film chemistry. Plasma processes and polymers. 19 (4), p. n/a. [Online].