Cover Image, Volume 139, Issue 21. Issue 21 (1st April 2022)

• Record Type: Journal Article
• Authors: Doi, Takashi; Rozhanskii, Igor; Nakamura, Takahiro; Shimokawa, Tsutomu
• Is Part Of: Journal of applied polymer science. Volume 139:Issue 21(2022)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2022-04-01
• Subjects: Polymers -- Periodicals; Polymerization -- Periodicals; 668.9
• DOI: 10.1002/app.51106
• Languages: English
• ISSNs: 0021-8995

Abstract

Abstract : This cover image by Takashi Doi and co‐authors shows the development of a novel, non‐reversible surface relief (SR) system using photoreactive bis‐ or tris‐cinnamate derivatives containing thermally curable benzoxazine moieties. Not only does their photodimerization and thermal ring‐opening polymerization contribute to this phenomenon, but also local mass transfer driven by concentration gradient of unreacted molecules. This image depicts that the thermally stable SR structure can be formed easily through a twostep development‐free process of ultraviolet exposure under a photomask and subsequent heat treatment. This system is promising an alternative technology to photolithography. DOI: 10.1002/app.52173