Substrate‐Free Chemical Vapor Deposition of Large‐Scale III–V Nanowires for High‐Performance Transistors and Broad‐Spectrum Photodetectors. Issue 6 (11th January 2022)
- Record Type:
- Journal Article
- Title:
- Substrate‐Free Chemical Vapor Deposition of Large‐Scale III–V Nanowires for High‐Performance Transistors and Broad‐Spectrum Photodetectors. Issue 6 (11th January 2022)
- Main Title:
- Substrate‐Free Chemical Vapor Deposition of Large‐Scale III–V Nanowires for High‐Performance Transistors and Broad‐Spectrum Photodetectors
- Authors:
- Yin, Yanxue
Guo, Yanan
Liu, Dong
Miao, Chengcheng
Liu, Fengjing
Zhuang, Xinming
Tan, Yang
Chen, Feng
Yang, Zai‐xing - Abstract:
- Abstract: Large‐scale growth of high‐quality III–V nanowires (NWs) on an expected substrate is challenging the next‐generation optoelectronic devices. In this work, high‐quality III–V NWs of binary GaSb, GaAs and ternary GaAs x Sb1− x, In x Ga1− x As are successfully prepared on the hard substrates of SiO2 /Si, amorphous glass and flexible substrates of mica, glass fiber, and carbon cloth by adopting the simple and low‐cost metal‐catalyzed chemical vapor deposition (CVD) method. The homogeneity of morphology, crystallinity, and stoichiometry is checked by scanning electron microscopy, X‐ray diffraction, high‐resolution transmission electron microscopy, and energy dispersive X‐ray spectroscopy, implying the high‐quality phase purity of III–V NWs on various substrates. When configured into NW field‐effect‐transistors, the electrical properties, such as field‐effect mobilities of GaSb NWs grown on various substrates show relatively similar satisfactory values. Meanwhile, the as‐fabricated GaSb NWs photodetector exhibits excellent broad‐spectrum photodetection ability from visible to near‐infrared bands. Furthermore, by adopting a home‐made stepper CVD method, large‐scale GaSb NWs with uniform morphology, crystallinity, stoichiometry, and electrical properties are prepared on glass. All results guide the easy growth of high‐quality functional NWs on any expected substrates for further photoelectronic applications. Abstract : Large‐scale high‐quality III–V nanowires (NWs) areAbstract: Large‐scale growth of high‐quality III–V nanowires (NWs) on an expected substrate is challenging the next‐generation optoelectronic devices. In this work, high‐quality III–V NWs of binary GaSb, GaAs and ternary GaAs x Sb1− x, In x Ga1− x As are successfully prepared on the hard substrates of SiO2 /Si, amorphous glass and flexible substrates of mica, glass fiber, and carbon cloth by adopting the simple and low‐cost metal‐catalyzed chemical vapor deposition (CVD) method. The homogeneity of morphology, crystallinity, and stoichiometry is checked by scanning electron microscopy, X‐ray diffraction, high‐resolution transmission electron microscopy, and energy dispersive X‐ray spectroscopy, implying the high‐quality phase purity of III–V NWs on various substrates. When configured into NW field‐effect‐transistors, the electrical properties, such as field‐effect mobilities of GaSb NWs grown on various substrates show relatively similar satisfactory values. Meanwhile, the as‐fabricated GaSb NWs photodetector exhibits excellent broad‐spectrum photodetection ability from visible to near‐infrared bands. Furthermore, by adopting a home‐made stepper CVD method, large‐scale GaSb NWs with uniform morphology, crystallinity, stoichiometry, and electrical properties are prepared on glass. All results guide the easy growth of high‐quality functional NWs on any expected substrates for further photoelectronic applications. Abstract : Large‐scale high‐quality III–V nanowires (NWs) are successfully prepared on various substrates, such as amorphous glass and flexible substrates of mica, glass fiber, carbon cloth by adopting the simple and low‐cost metal‐catalyzed chemical vapor deposition method. All of the as‐prepared GaSb NWs show relatively similar satisfactory high hole mobility, along with the excellent broad‐spectrum photodetection ability. … (more)
- Is Part Of:
- Advanced optical materials. Volume 10:Issue 6(2022)
- Journal:
- Advanced optical materials
- Issue:
- Volume 10:Issue 6(2022)
- Issue Display:
- Volume 10, Issue 6 (2022)
- Year:
- 2022
- Volume:
- 10
- Issue:
- 6
- Issue Sort Value:
- 2022-0010-0006-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-01-11
- Subjects:
- III–V nanowires -- growth substrate -- large‐scale chemical vapor deposition -- field‐effect‐transistors -- photodetectors
Optical materials -- Periodicals
Photonics -- Periodicals
620.11295 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2195-1071 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adom.202102291 ↗
- Languages:
- English
- ISSNs:
- 2195-1071
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.918600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 21181.xml