The effects of post-annealing technology on crystalline quality and properties of hexagonal boron nitride films deposited on sapphire substrates. (May 2022)
- Record Type:
- Journal Article
- Title:
- The effects of post-annealing technology on crystalline quality and properties of hexagonal boron nitride films deposited on sapphire substrates. (May 2022)
- Main Title:
- The effects of post-annealing technology on crystalline quality and properties of hexagonal boron nitride films deposited on sapphire substrates
- Authors:
- Chen, Xi
Sun, Haohang
Zhang, Wenbo
Tan, Chunbo
Liu, Xiuhuan
Zhao, Jihong
Hou, Lixin
Gao, Yanjun
Song, Junfeng
Chen, Zhanguo - Abstract:
- Abstract: Highly c-axis oriented hBN films were deposited onto sapphire substrates by a low-pressure chemical vapor deposition method. The influences of the post-annealing technology, including annealing temperatures (1500–1700 °C), annealing time (5–30 min), and annealing ambient (N2, H2, and Ar), on the crystalline quality and optical and photoelectric properties of deposited hBN films have been investigated. The post-annealing treatment can not only improve the ordering of hBN domains and remove the defects in hBN films, but also promote the growth of hBN grains and decrease the grain boundaries. The optimal crystalline quality was obtained when hBN films were annealed in N2 ambient at 1700 °C for 10 min. As for the hBN films annealed at the optimum conditions, average longitudinal and transverse sizes of hBN grains are estimated to be respectively about 27 and 108 nm, and the intrinsic absorption edge and the optical bandgap are severally 215 nm and 5.79 eV. Moreover, the photoelectric responsibility of an ultraviolet photodetector based on the annealed hBN films, whose cutoff wavelength is less than 224 nm, was increased by 8 times. Highlights: A c-axis oriented polycrystalline hBN film was deposited on a sapphire substrate. Post annealing technology including temperature, time and ambient were optimized. Post annealing narrows the FWHMs of B1s and N1s XPS peaks of hBN films. As for annealed hBN films, the absorption edge blue shifts and the bandgap increases. TheAbstract: Highly c-axis oriented hBN films were deposited onto sapphire substrates by a low-pressure chemical vapor deposition method. The influences of the post-annealing technology, including annealing temperatures (1500–1700 °C), annealing time (5–30 min), and annealing ambient (N2, H2, and Ar), on the crystalline quality and optical and photoelectric properties of deposited hBN films have been investigated. The post-annealing treatment can not only improve the ordering of hBN domains and remove the defects in hBN films, but also promote the growth of hBN grains and decrease the grain boundaries. The optimal crystalline quality was obtained when hBN films were annealed in N2 ambient at 1700 °C for 10 min. As for the hBN films annealed at the optimum conditions, average longitudinal and transverse sizes of hBN grains are estimated to be respectively about 27 and 108 nm, and the intrinsic absorption edge and the optical bandgap are severally 215 nm and 5.79 eV. Moreover, the photoelectric responsibility of an ultraviolet photodetector based on the annealed hBN films, whose cutoff wavelength is less than 224 nm, was increased by 8 times. Highlights: A c-axis oriented polycrystalline hBN film was deposited on a sapphire substrate. Post annealing technology including temperature, time and ambient were optimized. Post annealing narrows the FWHMs of B1s and N1s XPS peaks of hBN films. As for annealed hBN films, the absorption edge blue shifts and the bandgap increases. The responsivity of photodetectors based on annealed hBN films was improved 8 times. … (more)
- Is Part Of:
- Vacuum. Volume 199(2022)
- Journal:
- Vacuum
- Issue:
- Volume 199(2022)
- Issue Display:
- Volume 199, Issue 2022 (2022)
- Year:
- 2022
- Volume:
- 199
- Issue:
- 2022
- Issue Sort Value:
- 2022-0199-2022-0000
- Page Start:
- Page End:
- Publication Date:
- 2022-05
- Subjects:
- III-Nitrides -- hBN films -- Post annealing -- Crystalline quality -- Low-pressure chemical vapor deposition
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2022.110935 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 21026.xml