Cite
HARVARD Citation
Harada, N. et al. (2022). Controlling the interfacial reactions and environment of rare-earth ions in thin oxide films towards wafer-scalable quantum technologies. Materials advances. 3 (1), pp. 300-311. [Online].
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Harada, N. et al. (2022). Controlling the interfacial reactions and environment of rare-earth ions in thin oxide films towards wafer-scalable quantum technologies. Materials advances. 3 (1), pp. 300-311. [Online].