Cite
HARVARD Citation
Hayashi, J. et al. (2022). Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries. Japanese journal of applied physics. p. . [Online].
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Hayashi, J. et al. (2022). Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries. Japanese journal of applied physics. p. . [Online].