Cite
HARVARD Citation
Wang, K. et al. (2022). Influences of aluminum doping on the microstructures and electrical properties of tantalum nitride thin films before and after annealing. Vacuum. p. . [Online].
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Wang, K. et al. (2022). Influences of aluminum doping on the microstructures and electrical properties of tantalum nitride thin films before and after annealing. Vacuum. p. . [Online].