Cite
HARVARD Citation
Shu, G. et al. (2021). Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond. Functional Diamond. 1 (1), pp. 47-62. [Online].
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Shu, G. et al. (2021). Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond. Functional Diamond. 1 (1), pp. 47-62. [Online].