Optimal Scheme for Quantum Metrology. Issue 1 (23rd November 2021)

• Record Type: Journal Article
• Authors: Liu, Jing; Zhang, Mao; Chen, Hongzhen; Wang, Lingna; Yuan, Haidong
• Is Part Of: Advanced quantum technologies. Volume 5:Issue 1(2022)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-11-23
• Subjects: optimization -- quantum parameter estimation -- quantum Cramér–Rao bound -- quantum control; Quantum theory -- Periodicals; Quantum computing -- Periodicals; Quantum chemistry -- Periodicals; Quantum electronics -- Periodicals; 537.5
• DOI: 10.1002/qute.202100080
• Languages: English
• ISSNs: 2511-9044

Abstract

Abstract: Quantum metrology can achieve far better precision than classical metrology, and is one of the most important applications of quantum technologies in the real world. To attain the highest precision promised by quantum metrology, all steps of the schemes need to be optimized, which include the state preparation, parametrization, and measurement. Here the recent progresses on the optimization of these steps, which are essential for the identification and achievement of the ultimate precision limit in quantum metrology, are reviewed. It is hoped this provides a useful reference for the researchers in quantum metrology and related fields. Abstract : Quantum metrology promises far better precisions than the classical schemes. To achieve the highest precision of quantum metrology, all steps of the scheme need to be optimized. In this article, the authors review the progress on the identification and design of the optimal schemes that can achieve the highest precisions for the estimation of a single parameter in quantum metrology.