Cite
HARVARD Citation
Kindelmann, M. et al. (2021). Erosion behavior of Y2O3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation. Journal of the American Ceramic Society. 104 (3), pp. 1465-1474. [Online].
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Kindelmann, M. et al. (2021). Erosion behavior of Y2O3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation. Journal of the American Ceramic Society. 104 (3), pp. 1465-1474. [Online].