Fabrication and field emission properties of vertical, tapered GaN nanowires etched via phosphoric acid. (27th October 2021)
- Record Type:
- Journal Article
- Title:
- Fabrication and field emission properties of vertical, tapered GaN nanowires etched via phosphoric acid. (27th October 2021)
- Main Title:
- Fabrication and field emission properties of vertical, tapered GaN nanowires etched via phosphoric acid
- Authors:
- Kazanowska, Barbara A
Sapkota, Keshab R
Lu, Ping
Talin, A Alec
Bussmann, Ezra
Ohta, Taisuke
Gunning, Brendan P
Jones, Kevin S
Wang, George T - Abstract:
- Abstract: The controlled fabrication of vertical, tapered, and high-aspect ratio GaN nanowires via a two-step top-down process consisting of an inductively coupled plasma reactive ion etch followed by a hot, 85% H3 PO4 crystallographic wet etch is explored. The vertical nanowires are oriented in the [ 0001 ] direction and are bound by sidewalls comprising of { 33 6 ̄ 2 } semipolar planes which are at a 12° angle from the [0001] axis. High temperature H3 PO4 etching between 60 °C and 95 °C result in smooth semipolar faceting with no visible micro-faceting, whereas a 50 °C etch reveals a micro-faceted etch evolution. High-angle annular dark-field scanning transmission electron microscopy imaging confirms nanowire tip dimensions down to 8–12 nanometers. The activation energy associated with the etch process is 0.90 ± 0.09 eV, which is consistent with a reaction-rate limited dissolution process. The exposure of the { 33 6 ̄ 2 } type planes is consistent with etching barrier index calculations. The field emission properties of the nanowires were investigated via a nanoprobe in a scanning electron microscope as well as by a vacuum field emission electron microscope. The measurements show a gap size dependent turn-on voltage, with a maximum current of 33 nA and turn-on field of 1.92 V nm −1 for a 50 nm gap, and uniform emission across the array.
- Is Part Of:
- Nanotechnology. Volume 33:Number 3(2022)
- Journal:
- Nanotechnology
- Issue:
- Volume 33:Number 3(2022)
- Issue Display:
- Volume 33, Issue 3 (2022)
- Year:
- 2022
- Volume:
- 33
- Issue:
- 3
- Issue Sort Value:
- 2022-0033-0003-0000
- Page Start:
- Page End:
- Publication Date:
- 2021-10-27
- Subjects:
- GaN -- nanowire -- nanofabrication -- etching -- H3PO4 -- field emission
Nanotechnology -- Periodicals
Nanotechnology -- Periodicals
Nanotechnology
Publications périodiques
Nanotechnologies
Periodicals
620.5 - Journal URLs:
- http://www.iop.org/Journals/na ↗
http://iopscience.iop.org/0957-4484/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6528/ac2981 ↗
- Languages:
- English
- ISSNs:
- 0957-4484
- Deposit Type:
- Legaldeposit
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