Atomic-Scale Mechanisms for Interfacial Radiation Damage Resistance of Thin Film Oxide Heterostructures. (August 2019)

Record Type:: Journal Article
Title:: Atomic-Scale Mechanisms for Interfacial Radiation Damage Resistance of Thin Film Oxide Heterostructures. (August 2019)
Main Title:: Atomic-Scale Mechanisms for Interfacial Radiation Damage Resistance of Thin Film Oxide Heterostructures
Authors:: Spurgeon, Steven R.
Sassi, Michel
Kaspar, Tiffany
Jiang, Weilin
Shutthanandan, Vaithiyalingam
Abstract:
Is Part Of:: Microscopy and microanalysis. Volume 25:(2022)Supplement 2
Journal:: Microscopy and microanalysis
Issue:: Volume 25:(2022)Supplement 2
Issue Display:: Volume 25, Issue 2 (2019)
Year:: 2019
Volume:: 25
Issue:: 2
Issue Sort Value:: 2019-0025-0002-0000
Page Start:: 1562
Page End:: 1563
Publication Date:: 2019-08
Subjects:: Microscopy -- Periodicals
Microchemistry -- Periodicals
502.82
Journal URLs:: https://academic.oup.com/mam ↗
http://journals.cambridge.org/action/displayJournal?jid=MAM ↗
http://link.springer.de/link/service/journals/10005/index.htm ↗
http://firstsearch.oclc.org ↗
DOI:: 10.1017/S1431927619008547 ↗
Languages:: English
ISSNs:: 1431-9276
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library HMNTS - ELD Digital store
Ingest File:: 20025.xml