In Situ Observation of Pressurized Microcrack Growth in Silicon. Issue 23 (1st August 2021)
- Record Type:
- Journal Article
- Title:
- In Situ Observation of Pressurized Microcrack Growth in Silicon. Issue 23 (1st August 2021)
- Main Title:
- In Situ Observation of Pressurized Microcrack Growth in Silicon
- Authors:
- Colonel, Lucas
Mazen, Frédéric
Landru, Didier
Kononchuk, Oleg
Ben Mohamed, Nadia
Rieutord, François - Other Names:
- Brehm Moritz guestEditor.
Springholz Gunther guestEditor. - Abstract:
- Abstract : The evolution of micrometer‐scale cracks in hydrogen‐ and helium‐implanted silicon during isothermal annealing is studied using confocal IR microscopy. Herein, it is demonstrated that the dominant mechanism of microcrack growth is crack coalescence. The coalescence of two cracks causes a sudden crack opening in silicon and leads to the formation of a larger crack. The surface of this large crack is equal to the sum of the surface areas of the two former cracks plus the opened zone. As a result, it has a less circular shape than both initial cracks. After the coalescence, the new pressurized crack surface evolves quickly and its shape circularizes again. Before their coalescence, the measurement of the distance between two microcracks reveals the increase of the gap closure velocity as two microcracks come closer due to the interaction of their stress fields. In addition, the growth of isolated cracks without coalescence due to implanted gas diffusion and crack front curvature effect on stress is detected. It is evidenced that two geometric parameters, the distance between neighboring cracks and the local curvature of the crack front, contribute to the growth of a pressurized crack. Abstract : The evolution of pressurized micrometer‐scale cracks in light‐gas‐implanted silicon upon isothermal annealing is studied in situ using confocal IR microscopy. The major changes of such crack distributions are due to crack coalescence, which is driven by local stress effectsAbstract : The evolution of micrometer‐scale cracks in hydrogen‐ and helium‐implanted silicon during isothermal annealing is studied using confocal IR microscopy. Herein, it is demonstrated that the dominant mechanism of microcrack growth is crack coalescence. The coalescence of two cracks causes a sudden crack opening in silicon and leads to the formation of a larger crack. The surface of this large crack is equal to the sum of the surface areas of the two former cracks plus the opened zone. As a result, it has a less circular shape than both initial cracks. After the coalescence, the new pressurized crack surface evolves quickly and its shape circularizes again. Before their coalescence, the measurement of the distance between two microcracks reveals the increase of the gap closure velocity as two microcracks come closer due to the interaction of their stress fields. In addition, the growth of isolated cracks without coalescence due to implanted gas diffusion and crack front curvature effect on stress is detected. It is evidenced that two geometric parameters, the distance between neighboring cracks and the local curvature of the crack front, contribute to the growth of a pressurized crack. Abstract : The evolution of pressurized micrometer‐scale cracks in light‐gas‐implanted silicon upon isothermal annealing is studied in situ using confocal IR microscopy. The major changes of such crack distributions are due to crack coalescence, which is driven by local stress effects such as crack front curvature and stress amplification between neighboring cracks. … (more)
- Is Part Of:
- Physica status solidi. Volume 218:Issue 23(2021)
- Journal:
- Physica status solidi
- Issue:
- Volume 218:Issue 23(2021)
- Issue Display:
- Volume 218, Issue 23 (2021)
- Year:
- 2021
- Volume:
- 218
- Issue:
- 23
- Issue Sort Value:
- 2021-0218-0023-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2021-08-01
- Subjects:
- crack growth -- ion implantation -- particle analysis -- silicon -- Smart Cut
Solid state physics -- Periodicals
Solids -- Industrial applications -- Periodicals
530.41 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/pssa.202100219 ↗
- Languages:
- English
- ISSNs:
- 1862-6300
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.210000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 19986.xml