Cite
HARVARD Citation
Widiapradja, L. et al. (2021). 2D MoS2 Charge Injection Memory Transistors Utilizing Hetero‐Stack SiO2/HfO2 Dielectrics and Oxide Interface Traps. Advanced Electronic Materials. p. n/a. [Online].
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Widiapradja, L. et al. (2021). 2D MoS2 Charge Injection Memory Transistors Utilizing Hetero‐Stack SiO2/HfO2 Dielectrics and Oxide Interface Traps. Advanced Electronic Materials. p. n/a. [Online].