Water vapor and hydrogen gas diffusion barrier characteristics of Al2O3–alucone multi-layer structures for flexible OLED display applications. Issue 43 (28th October 2021)
- Record Type:
- Journal Article
- Title:
- Water vapor and hydrogen gas diffusion barrier characteristics of Al2O3–alucone multi-layer structures for flexible OLED display applications. Issue 43 (28th October 2021)
- Main Title:
- Water vapor and hydrogen gas diffusion barrier characteristics of Al2O3–alucone multi-layer structures for flexible OLED display applications
- Authors:
- Han, Ju-Hwan
Kim, Tae-Yeon
Kim, Dong-Yeon
Yang, Hae Lin
Park, Jin-Seong - Abstract:
- Abstract : Al2 O3 /Alucone multi-layer films fabricated by alternate ALD/MLD process were evaluated for the gas diffusion barrier property for H2 O and H2, indicating enhanced tortuosity and flexibility of multi-layer structure. Abstract : Organic light emitting diodes (OLEDs) and amorphous oxide semiconductors (AOSs), which are very important technologies in high performance flexible displays, have issues related to degradation due to diffusion of water and hydrogen, respectively. To solve these issues, gas diffusion barrier properties were evaluated with aluminum oxide deposited by atomic layer deposition (ALD) and alucone deposited by molecular layer deposition (MLD) using trimethylaluminum (TMA) as a metal precursor and H2 O and hydroquinone (HQ) as co-reactants, respectively. The water vapor transmission rate (WVTR) and hydrogen gas permeability (HGP) were measured for the fabricated films via electrical calcium tests and vacuum time-lag, respectively. To enhance the diffusion barrier properties, Al2 O3 /alucone hybrid multi-layer structures were successfully deposited through an in situ ALD/MLD process. The 4.5 dyads of the Al2 O3 /alucone structure showed improved barrier properties compared to the single Al2 O3 film with a WVTR of 8.24 × 10 −5 g m −2 day −1 and a HGP of 9.93 × 10 −5 barrer, and factors related to gas diffusion in multi-layer structures were discussed. The stability to external stress was also evaluated based on the WVTR change rate after the bendingAbstract : Al2 O3 /Alucone multi-layer films fabricated by alternate ALD/MLD process were evaluated for the gas diffusion barrier property for H2 O and H2, indicating enhanced tortuosity and flexibility of multi-layer structure. Abstract : Organic light emitting diodes (OLEDs) and amorphous oxide semiconductors (AOSs), which are very important technologies in high performance flexible displays, have issues related to degradation due to diffusion of water and hydrogen, respectively. To solve these issues, gas diffusion barrier properties were evaluated with aluminum oxide deposited by atomic layer deposition (ALD) and alucone deposited by molecular layer deposition (MLD) using trimethylaluminum (TMA) as a metal precursor and H2 O and hydroquinone (HQ) as co-reactants, respectively. The water vapor transmission rate (WVTR) and hydrogen gas permeability (HGP) were measured for the fabricated films via electrical calcium tests and vacuum time-lag, respectively. To enhance the diffusion barrier properties, Al2 O3 /alucone hybrid multi-layer structures were successfully deposited through an in situ ALD/MLD process. The 4.5 dyads of the Al2 O3 /alucone structure showed improved barrier properties compared to the single Al2 O3 film with a WVTR of 8.24 × 10 −5 g m −2 day −1 and a HGP of 9.93 × 10 −5 barrer, and factors related to gas diffusion in multi-layer structures were discussed. The stability to external stress was also evaluated based on the WVTR change rate after the bending test, and we confirmed that the stability of the multi-layer structures was improved due to the flexibility of inserted alucone layers. All the developed structures had a high optical transmittance of >80% in the 300–800 nm wavelength region based on UV-vis measurements. … (more)
- Is Part Of:
- Dalton transactions. Volume 50:Issue 43(2021)
- Journal:
- Dalton transactions
- Issue:
- Volume 50:Issue 43(2021)
- Issue Display:
- Volume 50, Issue 43 (2021)
- Year:
- 2021
- Volume:
- 50
- Issue:
- 43
- Issue Sort Value:
- 2021-0050-0043-0000
- Page Start:
- 15841
- Page End:
- 15848
- Publication Date:
- 2021-10-28
- Subjects:
- Chemistry, Inorganic -- Periodicals
Chemistry, Physical and theoretical -- Periodicals
Chemistry, Inorganic -- Periodicals
546.05 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/dt#!issueid=dt043040&type=current&issnprint=1477-9226 ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d1dt02989d ↗
- Languages:
- English
- ISSNs:
- 1477-9226
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3517.830000
British Library DSC - BLDSS-3PM
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- 19871.xml