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HARVARD Citation
Kriti, . et al. (2022). Effect of 150 keV Ti+ ion implantation on the structural, optical, and electrical properties of nonstoichiometric WO2.72 thin films. Materials research bulletin. p. . [Online].
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Kriti, . et al. (2022). Effect of 150 keV Ti+ ion implantation on the structural, optical, and electrical properties of nonstoichiometric WO2.72 thin films. Materials research bulletin. p. . [Online].