Cite
HARVARD Citation
Hirata, A. et al. (n.d.). Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma. Japanese journal of applied physics. p. . [Online].
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Hirata, A. et al. (n.d.). Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma. Japanese journal of applied physics. p. . [Online].