Erratum: "Effect of carbon in Si oxide interlayers of the Al2O3/4H-SiC structure on interfacial reaction by oxygen radical treatment" [Jpn. J. Appl. Phys. 58 SBBD05 (2019)]. (27th March 2019)

Record Type:: Journal Article
Title:: Erratum: "Effect of carbon in Si oxide interlayers of the Al2O3/4H-SiC structure on interfacial reaction by oxygen radical treatment" [Jpn. J. Appl. Phys. 58 SBBD05 (2019)]. (27th March 2019)
Main Title:: Erratum: "Effect of carbon in Si oxide interlayers of the Al2O3/4H-SiC structure on interfacial reaction by oxygen radical treatment" [Jpn. J. Appl. Phys. 58 SBBD05 (2019)]
Authors:: Doi, Takuma
Takeuchi, Wakana
Shibayama, Shigehisa
Sakashita, Mitsuo
Taoka, Noriyuki
Nakatsuka, Osamu
Zaima, Shigeaki
Abstract:
Is Part Of:: Japanese journal of applied physics. Volume 58:Number SB(2019)
Journal:: Japanese journal of applied physics
Issue:: Volume 58:Number SB(2019)
Issue Display:: Volume 58, Issue 2019 (2019)
Year:: 2019
Volume:: 58
Issue:: 2019
Issue Sort Value:: 2019-0058-2019-0000
Page Start:
Page End:
Publication Date:: 2019-03-27
Subjects:: Physics -- Periodicals
621.05
Journal URLs:: http://iopscience.iop.org/1347-4065/ ↗
http://ioppublishing.org/ ↗
DOI:: 10.7567/1347-4065/ab0f24 ↗
Languages:: English
ISSNs:: 0021-4922
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - BLDSS-3PM
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Ingest File:: 19596.xml