Cite
HARVARD Citation
Zhou, J. et al. (2022). A 6.5 nm thick anti-ferroelectric HfAlOx film for energy storage devices with a high density of 63.7 J cm−3. Journal of physics. p. . [Online].
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Zhou, J. et al. (2022). A 6.5 nm thick anti-ferroelectric HfAlOx film for energy storage devices with a high density of 63.7 J cm−3. Journal of physics. p. . [Online].