Investigations on the effect of process parameters on the growth of vertically oriented graphene sheet in plasma‐enhanced chemical vapour deposition system. Issue 9 (4th August 2021)

• Record Type: Journal Article
• Authors: Gupta, Neha; Gupta, Ravi; Sharma, Suresh C.
• Is Part Of: Contributions to plasma physics. Volume 61:Issue 9(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-08-04
• Subjects: gas pressure -- PECVD -- plasma power -- process parameters -- vertically oriented graphene sheet; Plasma (Ionized gases) -- Periodicals; Electronic journals; 530.44
• DOI: 10.1002/ctpp.202100069
• Languages: English
• ISSNs: 0863-1042

Abstract

Abstract: A multistage numerical model comprising the plasma kinetics and surface deposition sub‐models is developed to study the influence of process parameters, namely, total gas pressure and input plasma power on the plasma chemistry and growth characteristics of vertically oriented graphene sheets (VOGS) grown in the plasma‐enhanced chemical vapour deposition system containing the Ar + H2 + C2 H2 reactive gas mixture. The spectral and spatial distributions of temperature and number densities, respectively, of plasma species, that is, charged and neutral species in the plasma reactor, are examined using inductively coupled plasma module of COMSOL Multiphysics 5.2 modelling suite. The numerical data from the computational plasma model are fed as the input parameters for the surface deposition model, and from the simulation results, it is found that there is a significant drop in the densities of various plasma species as one goes from the bulk plasma region to the substrate surface. The significant loss of the energetic electrons is observed in the plasma region at high pressure (for constant input power) and low input power (for constant gas pressure). At low pressure, the carbon species generate at higher rates on the catalyst nanoislands surface, thus enhancing the growth and surface density of VOGS. However, it is found that VOGS growth rate increases when input plasma power is raised from 100 to 300 W and decreases with further increase in the plasma power. A good comparison of the model outcomes with the available experimental results confirms the adequacy of the present model.