Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrix. (24th June 2019)
- Record Type:
- Journal Article
- Title:
- Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrix. (24th June 2019)
- Main Title:
- Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrix
- Authors:
- Sultan, M T
Gudmundsson, J T
Manolescu, A
Teodorescu, V S
Ciurea, M L
Svavarsson, H G - Abstract:
- Abstract: SiGe nanoparticles dispersed in a dielectric matrix exhibit properties different from those of bulk and have shown great potential in devices for application in advanced optoelectronics. Annealing is a common fabrication step used to increase crystallinity and to form nanoparticles in such a system. A frequent downside of such annealing treatment is the formation of insulating SiO2 layer at the matrix/SiGe interface, degrading the optical properties of the structure. An annealing process that could bypass this downside would therefore be of great interest. In this work, a short-time furnace annealing of a SiGe/TiO2 system is applied to obtain SiGe nanoparticles without formation of the undesired SiO2 layer between the dielectric matrix (TiO2 ) and SiGe. The structures were prepared by depositing alternate layers of TiO2 and SiGe films, using direct-current magnetron sputtering technique. A wide range spectral response with a response-threshold up to ∼1300 nm was obtained, accompanied with an increase in photo-response of more than two-orders of magnitude. Scanning electron microscopy, transmission electron microscopy, energy-dispersive x-ray spectroscopy and grazing incidence x-ray diffraction were used to analyze the morphological changes in respective structures. Photoconductive properties were studied by measuring photocurrent spectra using applied dc-voltages at various temperatures.
- Is Part Of:
- Nanotechnology. Volume 30:Number 36(2019)
- Journal:
- Nanotechnology
- Issue:
- Volume 30:Number 36(2019)
- Issue Display:
- Volume 30, Issue 36 (2019)
- Year:
- 2019
- Volume:
- 30
- Issue:
- 36
- Issue Sort Value:
- 2019-0030-0036-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-06-24
- Subjects:
- SiGe nanocrystals -- SiO2 -- TiO2 -- photocurrent -- TEM -- thermal annealing
Nanotechnology -- Periodicals
Nanotechnology -- Periodicals
Nanotechnology
Publications périodiques
Nanotechnologies
Periodicals
620.5 - Journal URLs:
- http://www.iop.org/Journals/na ↗
http://iopscience.iop.org/0957-4484/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6528/ab260e ↗
- Languages:
- English
- ISSNs:
- 0957-4484
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
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- 19312.xml