Metallic-mode reactive sputtering of nickel oxide thin films and characterization of their electrochromic properties. (16th April 2019)

• Record Type: Journal Article
• Authors: Yokoiwa, Yuki; Abe, Yoshio; Kawamura, Midori; Kim, Kyung Ho; Kiba, Takayuki
• Is Part Of: Japanese journal of applied physics. Volume 58:Number 5(2019)
• Publication Date: 2019-04-16
• Subjects: nickel oxide -- high deposition rate -- target state -- electrochromic -- water vapor -- substrate cooling; Physics -- Periodicals; 621.05
• DOI: 10.7567/1347-4065/ab1189
• Languages: English
• ISSNs: 0021-4922

Abstract

Abstract: Nickel oxide is a promising electrochromic (EC) material, and it is a material that changes color upon undergoing electrochemical oxidation and reduction. In this study, we prepared nickel oxide thin films by sputtering a nickel metal target using water vapor (H2 O) as a reactive gas, and investigated the effects of substrate cooling and water vapor flow ratio in the atmosphere of argon (Ar) gas, R H2 O = H2 O/(Ar + H2 O). High and constant target voltage and plasma emission peaks of Ni atoms were obtained up to R H2 O = 75% at ‒80 °C, indicating that the Ni target maintained a metallic state. The deposition rate increased with increasing R H2 O when the substrates were cooled, and a maximum deposition rate of 34.6 nm min −1 was obtained at R H2 O = 50%. The nickel oxide thin films that were formed in the metallic target mode showed high transmittance in the as-deposited state and good EC properties.