Cite
HARVARD Citation
Sharma, S. et al. (2021). Optimization of SrRuO3 bottom electrodes fabricated by RF magnetron ion sputtering for new generation devices. Materials today. pp. 1561-1563. [Online].
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Sharma, S. et al. (2021). Optimization of SrRuO3 bottom electrodes fabricated by RF magnetron ion sputtering for new generation devices. Materials today. pp. 1561-1563. [Online].