Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. (8th February 2019)

• Record Type: Journal Article
• Authors: Winter, Andreas; Ekinci, Yasin; Gölzhäuser, Armin; Turchanin, Andrey
• Is Part Of: 2D materials. Volume 6:Number 2(2019)
• Publication Date: 2019-02-08
• Subjects: graphene -- carbon nanomembrane -- EUV interference lithography -- nanoribbon -- nanomesh; Graphene -- Periodicals; Materials science -- Periodicals; Nanostructured materials -- Periodicals; 620.115
• DOI: 10.1088/2053-1583/ab0014
• Languages: English
• ISSNs: 2053-1583

Abstract

Abstract: Two-dimensional materials, such as graphene, molecular nanosheets, hexagonal boron nitride or transition metal dichalcogenides have recently attracted substantial interest due to their potential use in electronics, chemical and biological sensors, nanooptics, and catalysis. For most of these applications, the functional nanostructures have to be prepared lithographically. In this respect, extreme ultraviolet interference lithography provides both high-resolution patterning with an ultimate limit in the sub-10 nm range and high throughput capability. Here we present the preparation of nanopatterned 1 nm thick freestanding molecular nanosheets—carbon nanomembranes (CNMs)—and single layer graphene employing this method and their characterization with a helium ion microscope. We demonstrate periodic arrays of suspended nanostructures of CNMs and graphene including nanoribbons with width between 20 nm and 500 nm and nanomeshes with openings between 140 nm and 300 nm and mesh lines down to 90 nm.