Low-temperature deposition of α-Al2O3 film using Al+α-Al2O3 composite target by radio frequency magnetron sputtering. (8th May 2019)

• Record Type: Journal Article
• Authors: Cheng, Yitian; Qiu, Wanqi; Zhou, Kesong; Yang, Yu; Jiao, Dongling; Liu, Zhongwu; Zhong, Xichun
• Is Part Of: Materials research express. Volume 6:Number 8(2019)
• Publication Date: 2019-05-08
• Subjects: α-alumina -- reactive radio frequency magnetron sputtering -- composite target -- low temperature -- nanoindentation; Materials science -- Research -- Periodicals; Materials science -- Periodicals; 620.11
• DOI: 10.1088/2053-1591/ab1c95
• Languages: English
• ISSNs: 2053-1591

Abstract

Abstract: The realization of low temperature deposition of α -Al2 O3 films is important for expanding its application in cutting tools, diffusion barrier and anti-oxidization coating. Here, the alumina films were deposited on Si(100) substrates by radio frequency magnetron sputtering using various targets of Al, α -Al2 O3, and Al + 15 wt% α -Al2 O3 composite. The elemental composition, phase constitution, microstructure, morphology and mechanical property of the as-deposited films were characterized by various techniques. The results show that the film deposited from the α -Al2 O3 target is composed of amorphous and α -Al2 O3, while the single phase α -Al2 O3 film was successfully deposited by reactively sputtering the composite target at a substrate temperature of 550 °C. The hardness of the α -Al2 O3 film deposited from Al+ α -Al2 O3 composite target was measured as ∼23.8 GPa.