Cite
HARVARD Citation
Samanta, S. et al. (2021). Multi‐Step Chemical Solution Deposition‐Annealing Process Toward Wake‐Up Free Ferroelectricity in Y:HfO2 Films. Advanced materials interfaces. 8 (18), p. n/a. [Online].
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Samanta, S. et al. (2021). Multi‐Step Chemical Solution Deposition‐Annealing Process Toward Wake‐Up Free Ferroelectricity in Y:HfO2 Films. Advanced materials interfaces. 8 (18), p. n/a. [Online].