P‐13.7: Tuning the Inorganic‐Organic Property of Silicon Nitride for the Encapsulation of OLED devices. (26th August 2021)

• Record Type: Journal Article
• Authors: Miao, Yang; Du, Yanying; Qian, Jiajia; Li, Jinchuan; Cao, Weiran
• Is Part Of: Digest of technical papers. Volume 52(2021)Supplement 2
• Page Start: 1027
• Page End: 1029
• Publication Date: 2021-08-26
• Subjects: OLED -- TFE -- PECVD -- SiNy; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.15364
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : Employing the inorganic‐organic multi‐layer thin film encapsulation (TFE) was an efficient way to retard the water permeation to OLEDs and enhance the life time of OLED devices. In this study, a novel SiNy film with kind of organic property was developed by adjusting the deposition condition of plasma‐enhanced chemical vapor deposition (PECVD), and the SiNy was used as the buffer layer for the fabrication of multi‐layer TFE. Compared to the normally inorganic SiNx, the buffer SiNy possessed more chemical bonds in chain, which endowed the SiNy with low stress and coverage ability. Subsequently, the buffer SiNy was employed in the encapsulation of OLEDs, and the RA test showed the SiNy buffer could efficiently prolong the lifetime of OLEDs.