Dominant formation of h-BC2N in h-BxCyNz films: CVD synthesis and characterization. (September 2021)
- Record Type:
- Journal Article
- Title:
- Dominant formation of h-BC2N in h-BxCyNz films: CVD synthesis and characterization. (September 2021)
- Main Title:
- Dominant formation of h-BC2N in h-BxCyNz films: CVD synthesis and characterization
- Authors:
- Seo, Tae Hoon
Lee, WonKi
Lee, Kyu Seung
Hwang, Jun Yeon
Son, Dong Ick
Ahn, Seokhoon
Cho, Hyunjin
Kim, Myung Jong - Abstract:
- Abstract: Arranging carbon, boron, and nitrogen atoms in a sp 2 network can give rise to tunable electronic properties from insulators ( h -BN) to metals (graphene). For semiconductor applications, the construction of a ternary structure ( h -Bx Cy Nz ) is highly desirable, but its uniform and large-area synthesis has remained a great challenge. This challenge has been attempted by a facile chemical vapor deposition method with a single molecular precursor, N-tri-methyl borazine where boron, carbon, and nitrogen atoms are covalently bonded, onto Ni catalysts in conjunction with the quenching method after the synthesis. The atomic structure closely resembles h -BC2 N as revealed by XPS (B:C:N ∼ 1:1.8:1) and nanometer resolution EELS mapping, and the photoluminescence and electroluminescence observed from the h -BC2 N film were in agreement, proving its well-established bandgap of 2.15 eV. As a practical application, the utilization of h -BC2 N film for 2D light emitting diodes was demonstrated. Though films might have impurities such as small h -BN fragments and h -Bx Cy Nz other than h -BC2 N phase, we believe that this work provide a starting point of controlling the ternary BCN compounds that retain sp 2 hybridized chemical bonds. Graphical abstract: h-BC2N has been synthesized by a facile chemical vapor deposition method with a single molecular precursor, N-tri-methyl borazine. Image 1
- Is Part Of:
- Carbon. Volume 182(2021)
- Journal:
- Carbon
- Issue:
- Volume 182(2021)
- Issue Display:
- Volume 182, Issue 2021 (2021)
- Year:
- 2021
- Volume:
- 182
- Issue:
- 2021
- Issue Sort Value:
- 2021-0182-2021-0000
- Page Start:
- 791
- Page End:
- 798
- Publication Date:
- 2021-09
- Subjects:
- h-BC2N -- Bandgap -- Chemical vapor deposition -- Optoelectronic application
Carbon -- Periodicals
Carbone -- Périodiques
Koolstof
Toepassingen
Electronic journals
546.681 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00086223 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.carbon.2021.06.080 ↗
- Languages:
- English
- ISSNs:
- 0008-6223
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3050.991000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 18487.xml