Comparison of HMDSO and HMDSN as precursors for high‐barrier plasma‐polymerized multilayer coating systems on polyethylene terephthalate films. Issue 8 (25th May 2021)

• Record Type: Journal Article
• Authors: Jaritz, Montgomery; Alizadeh, Philipp; Wilski, Stefan; Kleines, Lara; Dahlmann, Rainer
• Is Part Of: Plasma processes and polymers. Volume 18:Issue 8(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-05-25
• Subjects: barrier coatings -- functionalization -- multilayer coatings -- plasma‐enhanced chemical vapor deposition (PECVD) -- silicon‐based precursors; Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.202100018
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract : In times of ever‐growing demands for sustainable resource management a general interest in coating technology becomes noticeable. Meeting those emerging needs demands a good understanding of relevant precursors. This article's aim is to investigate differences in two widely used silicon based precursors and giving hypotheses on underlying deposition behaviors. Therefore, single and multilayer barrier coatings were deposited and characterized in regard to their chemical structure, permeation behavior, and topology. Abstract: Hexamethyldisiloxane (HMDSO)‐ and hexamethyldisilazane (HMDSN)‐based plasma polymeric coatings are compared as elements of multilayer barrier coatings, consisting of an alternating structure of organosilicon and silicon oxide layers. Furthermore, these coatings are examined with regard to their deposition rate, critical layer thickness, surface roughness, atomic composition, and gas permeability. It is investigated how these attributes correlate in the overall barrier performance of a multilayer coating system. The concluded examinations show that HMDSN delivers best overall barrier performances as a precursor at high energy densities. For lower energy densities, the use of HMDSO is preferable. Intermediate layer thickness should not exceed six nanometers for best barrier performance in the given experiment configuration.