Metal Particle Evolution Behavior during Metal Assisted Chemical Etching of Silicon. (5th August 2021)

• Record Type: Journal Article
• Authors: Hu, Ya; Jin, Chensheng; Liu, Ying; Yang, Xiaoyu; Liao, Zhiyuan; Zhang, Baoguo; Zhou, Yilai; Chen, Ao; Wu, Lin; Liu, Jing; Peng, Kuiqing
• Is Part Of: ECS journal of solid state science and technology. Volume 10:Number 8(2021)
• Publication Date: 2021-08-05
• Subjects: Solid state chemistry -- Periodicals; Electronics -- Materials -- Periodicals; Electrochemistry -- Periodicals; 541.0421
• DOI: 10.1149/2162-8777/ac17be
• Languages: English
• ISSNs: 2162-8777

Abstract

Abstract : Due to its high practicability, metal assisted chemical etching (MACE) has become a popular silicon micro-nano structure preparation method. This paper explores the metal nanoparticle film dissolution and re-deposition evolution behavior in oxidizing HF solution during the MACE process. The results show Ag nanoparticles experience both oxidation dissolve and reduction deposit during MACE in HF–H2 O2 –H2 O and HF–Fe(NO3 )3 –H2 O corrosion solution. The Au nanoparticle can remain stable in the HF–Fe(NO3 )3 –H2 O solution, providing a strategy to keep the patterns' high etching accuracy of the silicon micro-nano structure. This work illuminates the reaction principle and provides a new insight to improving the etching accuracy, stability, and speed of the MACE technology.