The interface of SiO2/ZnS films studied by high resolution X-ray photoluminescence. Issue 1 (January 2018)
- Record Type:
- Journal Article
- Title:
- The interface of SiO2/ZnS films studied by high resolution X-ray photoluminescence. Issue 1 (January 2018)
- Main Title:
- The interface of SiO2/ZnS films studied by high resolution X-ray photoluminescence
- Authors:
- Acharya, Shinjita
Trejo, Orlando
Dadlani, Anup
Torgersen, Jan
Berto, Filippo
Prinz, Fritz - Abstract:
- HIGHLIGHTS: A clear shift of the S 2p peak with the number of deposition cycles showing that S is present in many different environments at the interface The confirmation of the surface confinement of this species as revealed by the XPS measurements at different angles. In a depth profile, the shift of the S 2p to higher energy is correlated to the rise of the Si 2p peak giving additional evidence that SO4 2- does not develop upon the exposure of the sample to air but is in fact a species for ZnS nucleation. ABSTRACT: Sharp interfaces in optoelectronic devices are key for proper band alignment. Despite its benefits as buffer layer, ZnS deposited via atomic layer deposition (ALD) renders intermixed interfaces to its substrate, which can be detrimental for device performance. Here, we are attempting to elucidate the chemical species deriving from this metal-oxide to metal-sulfide transition studying ultrathin film ZnS on SiO2 using high resolution X-ray photoluminescence spectroscopy (XPS). Regarding the S 2p spectra after a deposition of only three cycles of ZnS, we discover the many different chemical species in which S is present. These include intermediate oxides such as SO4 2- . These species become more obvious as we tilt the sample in the XPS chamber to shallower angles. Comparing the Si 2p and S 2p high resolution peaks in the depth profile, one can clearly uncover the confinement of SO4 2- to the interface of the underlying substrate. This may indicate that SiO2 /ZnSHIGHLIGHTS: A clear shift of the S 2p peak with the number of deposition cycles showing that S is present in many different environments at the interface The confirmation of the surface confinement of this species as revealed by the XPS measurements at different angles. In a depth profile, the shift of the S 2p to higher energy is correlated to the rise of the Si 2p peak giving additional evidence that SO4 2- does not develop upon the exposure of the sample to air but is in fact a species for ZnS nucleation. ABSTRACT: Sharp interfaces in optoelectronic devices are key for proper band alignment. Despite its benefits as buffer layer, ZnS deposited via atomic layer deposition (ALD) renders intermixed interfaces to its substrate, which can be detrimental for device performance. Here, we are attempting to elucidate the chemical species deriving from this metal-oxide to metal-sulfide transition studying ultrathin film ZnS on SiO2 using high resolution X-ray photoluminescence spectroscopy (XPS). Regarding the S 2p spectra after a deposition of only three cycles of ZnS, we discover the many different chemical species in which S is present. These include intermediate oxides such as SO4 2- . These species become more obvious as we tilt the sample in the XPS chamber to shallower angles. Comparing the Si 2p and S 2p high resolution peaks in the depth profile, one can clearly uncover the confinement of SO4 2- to the interface of the underlying substrate. This may indicate that SiO2 /ZnS interfaces contain interfacial sulphates that likely alter the electronic configuration of this interface. … (more)
- Is Part Of:
- Theoretical & applied mechanics letters. Volume 8:Issue 1(2018)
- Journal:
- Theoretical & applied mechanics letters
- Issue:
- Volume 8:Issue 1(2018)
- Issue Display:
- Volume 8, Issue 1 (2018)
- Year:
- 2018
- Volume:
- 8
- Issue:
- 1
- Issue Sort Value:
- 2018-0008-0001-0000
- Page Start:
- 24
- Page End:
- 27
- Publication Date:
- 2018-01
- Subjects:
- Atomic Layer Deposition -- Metal-Sulfide -- Zinc Sulfide -- Interface -- High resolution X-ray photoluminescence spectroscopy
Mechanics, Applied -- Periodicals
Mechanics, Analytic -- Periodicals
Mechanics, Analytic
Mechanics, Applied
Periodicals
620.1 - Journal URLs:
- http://www.sciencedirect.com/science/journal/20950349/ ↗
http://www.sciencedirect.com/ ↗
https://www.journals.elsevier.com/theoretical-and-applied-mechanics-letters ↗
http://taml.aip.org/ ↗ - DOI:
- 10.1016/j.taml.2018.01.008 ↗
- Languages:
- English
- ISSNs:
- 2095-0349
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 17995.xml