Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films. (17th April 2013)

• Record Type: Journal Article
• Authors: El-Shaer, A.; Abdelwahed, A. R.
• Other Names: Alfieri G. Academic Editor.; Sarker D. K. Academic Editor.; Suñol J. J. Academic Editor.
• Is Part Of: ISRN nanotechnology. Volume 2013(2013)
• Publication Date: 2013-04-17
• Subjects: Nanotechnology -- Periodicals; Nanotechnology; Nanotechnology; Electronic journals; Periodicals; Electronic journals; 620.5
• DOI: 10.1155/2013/271545
• Languages: English
• ISSNs: 2090-6064

Abstract

Abstract : Electrodeposition technique was employed to deposit cuprous oxide Cu2 O thin films. In this work, Cu2 O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2 O thin films was investigated.