Cite
HARVARD Citation
Scaffidi, R. et al. (2021). Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In, Ga)Se2 Thin Films: An Innovative Al2O3/HfO2 Multistack Design. Physica status solidi. 218 (14), p. n/a. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Scaffidi, R. et al. (2021). Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In, Ga)Se2 Thin Films: An Innovative Al2O3/HfO2 Multistack Design. Physica status solidi. 218 (14), p. n/a. [Online].