Mxene Synthesis: HCl‐Based Hydrothermal Etching Strategy toward Fluoride‐Free MXenes (Adv. Mater. 27/2021). Issue 27 (7th July 2021)

• Record Type: Journal Article
• Authors: Wang, Changda; Shou, Hongwei; Chen, Shuangming; Wei, Shiqiang; Lin, Yunxiang; Zhang, Pengjun; Liu, Zhanfeng; Zhu, Kefu; Guo, Xin; Wu, Xiaojun; Ajayan, Pulickel M.; Song, Li
• Is Part Of: Advanced materials. Volume 33:Issue 27(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-07-07
• Subjects: energy storage -- fluoride‐free MXenes -- high electrochemical performance -- hydrothermal etching -- MXenes -- supercapacitors; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.202170209
• Languages: English
• ISSNs: 0935-9648

Abstract

Abstract : New synthesis strategies of fluoride‐free MXenes beyond Ti3 C2 T x are imperative to extend 2D MXenes. In article number 2101015, Pulickel M. Ajayan, Li Song, and co‐workers simulate the feasibility of etching various MAX materials in HCl solution influenced by temperature and pressure. Fluoride‐free Mo2 CTx MXene is then obtained with high quality and efficiency via a controllable HCl hydrothermal etching method, which exhibits a modulated energy‐storage mechanism.