Uniaxially oriented nickel aluminum superalloy films sputtered with in situ heating. (7th July 2021)

• Record Type: Journal Article
• Authors: Tran, Phuoc Toan; Ngo, Hai Dang; Ngo, Thien Duc; Nagao, Tadaaki
• Is Part Of: Applied physics express. Volume 14:Number 8(2021)
• Publication Date: 2021-07-07
• Subjects: Nickel aluminum superalloy -- Thin-film growth -- Plasmonic film -- Photothermal device; Physics -- Periodicals; Technology -- Periodicals; 621.05
• DOI: 10.35848/1882-0786/ac0ecd
• Languages: English
• ISSNs: 1882-0778

Abstract

Abstract: We report uniaxially oriented nickel aluminum (NiAl) films grown by DC magnetron sputtering under in situ heating. The films self-organize in (110) orientation with relatively low surface roughness and tight grain boundaries in columnar structure. The electrical carrier concentration and resistivity are on the order of 10 21 cm −3 and 10 −5 Ω · cm, respectively. The plasmonic performance, as indicated by the dielectric function, is comparable to that of a NiAl single crystal and exceeds those of conventional refractory materials (molybdenum, tungsten, titanium nitride) at visible to NIR wavelengths. This work paves the way to superalloy-based plasmonic nanostructures for photothermal energy applications.